New Publication by V. Ukraintsev: http://www.glbnm.com/publications/Theroleofreferencemetrologyincontrolandsuccessofnanomanufacturing.pdf

We're coming back after a looo...ng period of silence. Thank you.

Publication page at gcrm.info was updated

Want to know more about Reference Metrology? Visit gcrm.info.

Opinion about current trends in metrology and process control for integrated circuits... spie.org/x105105.xml

I'm in San Jose CA today. SPIE Advanced Lithography is about to start. Thanks for following us. Stay tuned for hot news this week.

Last night was an accuracy night. Dr. Mark Phillips (Intel) gave a talk about overlay challenges. He was asking for true accuracy.

First day is almost over. Great keynote metrology presentation. So far intriguing "3D metrology" panel discussion. More to come...

Great session on new SEM developments. Excellent AFM session is going on right now.

The last day. Excellent morning session. Lots on accuracy. Hot topic. Afternoon session should be very interesting. Last minute news...

SPIE Advance Lithography/ Metrology, inspection and process control is over. Another great conference. Stay tuned for more nanometrology nws

Do you know that 14 nm node process flow may have more than 2000 process steps and more than half of them belong to metrology? Crazy...

Please submit your paper to 2016 SPIE Advanced Lithography, Metrology, Inspection and Process control Conference. Deadline September 8th.

Are you ready for SPIE Metrology, Inspection and Process Control Conference news? Stay tuned. Conference starts in 2 days...

Advanced Lithography SPIE brought together 2350 participants from around the world. 7 conferences covering various aspects of lithography.

SPIE Metrology, Inspection and Process Control Conference celebrates today 30 years anniversary!

If you're interested in SEM modeling check Proceedings of SPIE AL Metrology Conference (vol. 9778). They should be published in MAR 2016.

Dead line for SPIE 2017 Advanced Lithography, Metrology,Inspection and Process Control conference is SEP 8. Please submit your abstract.

Dear Friends, program of SPIE Adv. Litho 2018 is ready. Very strong Metrology submissions. Come to learn modern industrial Metrology FEB 25.

Twitter gets into politics and news and views policing... What a shame!