This week continuing counting down the top 10 most influential plasma-related articles published in JVST A - JVST B during the last two years AVS AVS Plasma Division And finally at #1 from Harm Knoops Erwin Kessels Oxford Instruments @TUeindhoven avs.scitation.org/doi/10.1116/1.…

Nice work from soumen mandal Cardiff University with #ALDep done @TUeindhoven doi.org/10.1016/j.carb… The challenge is that diamond growth on Ga2O3 for thermal management needs a seed/barrier. We found that Al2O3 doesn’t work but #Plasma #ALDep SiO2 does. #FlexAL Oxford Instruments Erwin Kessels

Experiments and DFT from Adriana Creatore’s group show how biasing in plasma #ALDep can lower O content. Oxygen can be removed from the surface by hydrogen if the ion energy is sufficient. Experiments done on Oxford Instruments #FlexAL @TUeindhoven Erwin Kessels doi.org/10.1039/D0NR08…

Please check out #ALDALE2021 on-demand talks. Not only from my Oxford Instruments colleague Yi Shu on strategies for nitride and oxide stacks by #ALDep, but for instance also for two talks by DCUPhysics who investigate TiO2 and cobalt nitride #ALDep on their new #FlexAL clustered with XPS.

Nice example by Moustapha Jaffal at #ALDALE2021 of using plasma #ALDep, quasi ALE and even sputtering using Ar plasma with substrate bias in a single tool, an @Oxinst #PlasmaTech #FlexAL MINATEC CEA-Leti Université Grenoble Alpes

Happy to see that the isotropic ALE process Nick Chittock developed last year was now also transferred to the @Oxinst FlexAL. Furthermore, combined with ALD it can smooth surfaces more than initially expected (and Nick even understands why). #ALDALE2021 @TUeindhoven Erwin Kessels

Just out! Don't miss our latest issue, now available online: acsjournals.co/siBW50FuSRx

Please check out these beautiful transmission electron microscopy (#TEM) images if you are interested in the conformality and gap-fill by plasma-assisted Atomic Layer Deposition (#ALDep). It made it to the cover of Chemistry of Materials lnkd.in/e5kyKMz

Bárbara Canto shows in #AMOGmbH, Oxford Instruments collaboration that monolayer hBN can protect #Graphene, when low-damage #PlasmaTech #ALDep Al2O3 is used. Shows that Atomfab is destined for more things than GaN power device passivation 😎 Ravi S Sundaram @max_lemme doi.org/10.1002/admt.2…

Challenge-based learning: This is how we have students unravelling complex nanoelectronic devices in our course about Plasma Processing including #ALDep and #ALEtch - Part 1 atomiclimits.com/2021/09/22/unr…

Collaborative study on Atomfab production tool: Oxford Instruments showed fast and uniform remote plasma #ALDep, @TUeindhoven measured plasma showing low damage conditions, James Watt School of Engineering, Uni. of Glasgow showed suitability for #GaNpower electronics & RF devices doi.org/10.1116/6.0001…

Don't miss talks at #AVS67. I made an overview on Ellipsometry for Atomic Scale Processing, but others @TUeindhoven talk about: e.g., MoS2 as barrier, germanium passivation, heterostructures of 2D materials, #ALEtch ion energy control, and area-selective #ALDep. Oxford Instruments tools

What´s the difference between ~99.3 % and ~99.8 % absorption? Check our Paper on #ALDep of #blackcoating invented Leibniz-IPHT using Oxford Instruments Tools. Or let´s talks AVSALD in June. pubs.acs.org/doi/abs/10.102…

A teaser by Ageeth Bol for #PapersMattinen his talk on low temperature plasma #ALDep of MoS2 on Wednesday at #ALDALE2022 @TUeindhoven Oxford Instruments

#ALDALE2022 good times Henrik Pedersen Erwin Kessels

ICYMI: Plasma Enhanced Atomic Layer Etching of High-k Layers on WS2 #JVSTA AVS avs.scitation.org/doi/10.1116/6.…

Cool presentation yesterday at #AVS68 by Haozhe Wang from the Minnich group @CalTech on isotropic #ALEtch of AlN done on an Oxford Instruments FlexAL. Great to see that the SF6/TMA process pioneered by Nick Chittock @TUeindhoven has many applications.

At euroCVD #BalticALD, Silke Peeters @TUeindhoven discusses how substrate biasing can help plasma #ALDep of tantalum carbonitride for quantum devices

Proud of Silke Peeters for the first paper in our project @TUeindhoven. Plasma #ALDep of high-quality TaCxNx-1 using substrate bias, these ultrathin superconducting films are promising for a range of #quantum devices.Oxford Instruments QuantumSensorsGlasgow Erwin Kessels doi.org/10.1063/5.0169…

Nice advice from @sean_t_barry in his invited talk at #mnc2023